SYMPOSIA PAPER Published: 01 January 1989
STP26046S

Advanced VLSI Isolation Technologies

Source

Common issues in VLSI isolation technologies have been identified. Based on these issues, a critical review of conventional and novel isolation technologies such as oxide, trench, SEG, SOS, SIMOX, and ZMR is presented in this paper.

Author Information

Kuo, Y
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Details
Developed by Committee: F01
Pages: 284–302
DOI: 10.1520/STP26046S
ISBN-EB: 978-0-8031-5107-9
ISBN-13: 978-0-8031-1273-5