Semiconductor Processing
Editor(s): D C Gupta
This volume addresses the problems in semiconductor technology that arise from rapid increase in device complexity and performance, the emergence of integrated systems-on-a-chip, automated factories, and silicon foundries. The book's theme is that the realization of acceptable yields and reliability will require greater manufacturing discipline from starting materials to finished devices. 51 papers cover crystal growth and epitaxial depositing, control of contaminants, material characterization defects, interconnection technology, ion implantation, and special processing techniques.
Table of Contents
DC Gupta
W Murray Bullis
JD Plummer
H-R Chang
JO Borland, M Kuo, J Shibley, B Roberts, R Schindler, T Dalrymple
DJ Bazley
WR Fahrner, D Bräunig, M Knoll, JR Laschinski
M Sasaki, K Sakamoto
J Barkanic, A Hoff, J Stach, B Golja
HL Berkowitz, CF Cook, JH Kwiatkowski, WM Goodreau
L Denes
AC Rapa
A Lieberman
PW Gaudet
JO Borland
JR Monkowski, D Heck, TA Baginski, D Kenney, RE Tressler
RB Swaroop
H Suga, Y Shimanuki, K Murai, K Endo
M Domenici, G Ferrero, P Malinverni
ASM Salih, HJ Kim, RF Davis, GA Rozgonyi
Y-S Shin, C-K Kim
LD Dyer
KH Yang
LW Shive, BK Schulte
K Krishnan, D Kuehl
SP Weeks
A Baghdadi
K Krishnan
H-D Chiou
RG Mazur
M Pawlik
JR Ehrstein, RG Downing, BR Stallard, DS Simons, RF Fleming
HK Charles, GV Clatterbaugh, JA Weiner
DF Hebert
WL Loofbourrow
S-P Hannula, J Wanagel, C-Y Li
JF Marshall, RP Sheppard
FA Lindberg
H Herzer
Wv Ammon, J Kemmer
H Hamanaka, K Kuriyama, M Yahagi, K Iwamura, C Kim, F Shiraishi, K Tsuji, S Minomura
YC Du, YF Zhang, XT Meng
AT Hunter, MH Young, HV Winston, OJ Marsh, RR Hart
M Yahagi, M Satoh, K Kuriyama, K Iwamura, C Kim, F Shiraishi
J Baxter, NW Crick
K Andresen, K Heydorn, E Nonbøl
JS Herring, RE Korenke
MJ Schell