Degradation of Dielectric Films by XeF Excimer Intermediates

M Loudiana; A Schmid; JT Dickinson

doi:10.1520/STP37261S

SYMPOSIA PAPER Published: 01 January 1983

STP37261S

Degradation of Dielectric Films by XeF Excimer Intermediates

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Many excimer laser designs require optical component surfaces to be in contact with both optical radiation and reactive components of the gain medium. The resulting environmental degradation of coatings on mirrors or windows is analyzed by isolating intermediates from the XeF gain medium and measuring quantitatively corrosive interaction between these species and the dielectric surfaces. Particular attention will be given to SiO₂ films whose reaction with XeF₂ and NF₂ with and without additional stimulation by ions will be surveyed. Temperature effects of the film substrate as well as the importance of synergistic effects for the stability of the SiO₂ coatings will be discussed.

Author Information

Loudiana, M

Schmid, A

Dickinson, JT

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Details

Developed by Committee: F01

Pages: 380–386

DOI: 10.1520/STP37261S

ISBN-EB: 978-0-8031-4865-9

ISBN-13: 978-0-8031-0708-3

Degradation of Dielectric Films by XeF Excimer Intermediates

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