Computerized Electron-Beam Linewidth Measuring and Inspection: A New Tool

TF Pomposo; VJ Coates

doi:10.1520/STP36188S

SYMPOSIA PAPER Published: 01 January 1983

STP36188S

Computerized Electron-Beam Linewidth Measuring and Inspection: A New Tool

Source

This paper describes a field emission linewidth measuring and inspection instrument. The low-voltage operation, which allows nondestructive measurement of critical dimensions on photoresist with good precision, is described. The effect on photoresist of nonpenetrating electrons in the low-voltage mode versus penetrating electrons in the high-voltage mode is discussed.

Author Information

Pomposo, TF

Nanometrics, Inc., Sunnyvale, Calif.

Coates, VJ

Nanometrics, Inc., Sunnyvale, Calif.

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Details

Developed by Committee: F01

Pages: 501–508

DOI: 10.1520/STP36188S

ISBN-EB: 978-0-8031-4871-0

ISBN-13: 978-0-8031-0243-9

Computerized Electron-Beam Linewidth Measuring and Inspection: A New Tool

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