Hydrogen/Chlorine Distributions in Silicon Dioxide: Detection and Model

JR Monkowski; J Stach; MD Monkowski; IST Tsong

doi:10.1520/STP36172S

SYMPOSIA PAPER Published: 01 January 1983

STP36172S

Hydrogen/Chlorine Distributions in Silicon Dioxide: Detection and Model

Source

Secondary ion mass spectrometry (SIMS) and electron microscopy have been used to investigate the distribution of hydrogen and chlorine in SiO₂ films thermally grown on silicon. These films have been grown in various ambients, including pure O₂, steam, HCl/O₂, and Cl₂/O₂, as well as HCl/O₂ mixtures diluted with N₂. The data suggest that there exists a strong interaction between the chlorine and the hydrogen, with the chlorine being a very effective gettering agent for hydrogen. The results of this investigation, as well as a model explaining the incorporation and distribution of the hydrogen and chlorine, are presented.

Author Information

Monkowski, JR

Pennsylvania State University, University Park, Pa.

Monkowski, MD

Pennsylvania State University, University Park, Pa.

Tsong, IST

Arizona State University, Tempe, Ariz.

Stach, J

Pennsylvania State University, University Park, Pa.

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Details

Developed by Committee: F01

Pages: 245–259

DOI: 10.1520/STP36172S

ISBN-EB: 978-0-8031-4871-0

ISBN-13: 978-0-8031-0243-9

Hydrogen/Chlorine Distributions in Silicon Dioxide: Detection and Model

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