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STP Published: 1961

STP300-EB

Materials and Electron Device Processing

Table of Contents

STP Individual Article Download Free

The Role of Impurities in Impurity-Dominated Electronic Materials and Devices

F. J. Biondi

Particulate Concentrations in Ultraclean Rooms

F. W. Van Luik

A Comparison of Electrostatic and High-Efficiency Impingement Air Filters for Use in Device Development Laboratories

George Helmke

Dust Monitoring by the Dry Slide Settling Technique

W. J. Whitfield, R. C. Marsh, I. M. Kodel

An Approach to Control of Transistor Processing Environments

C. A. Smith, T. Manns

Electron Beam Microanalyzer: A New Tool for Electron Device Development

J. S. Hayes

Detection of Inorganic Contamination on Surfaces by an EMF Measurement

D. G. Schimmel

Electrode Potential: A Tool for the Control of Materials and Processes in Electron Device Fabrication: I. EMF—Time Studies of Clean and Contaminated Platinum Electrodes

D. O. Feder, E. S. Jacob

Electrode Potential: A Tool for the Control of Materials and Processes in Electron Device Fabrication: II. EMF Studies of the Behavior of 36 Per Cent Nickel-Iron Alloy in Hydrogen Peroxide — Formic Acid Etchants

D. O. Feder, W. E. Howden, D. R. Huff, J. W. Richards

Use of Radioisotope Tracer Techniques in Contamination Studies

T. J. Bulat

Gas-Phase Proportional Counting: A Radiotracer Technique for Examination of Electronic Components and Materials

Herman A. Stern

Fluorine Release from Glasses

Josef Francel

Elimination of Contaminants from Electron Tube Components: Automation of Chemical Processing

C. O. Thomas, W. H. Craft, D. E. Koontz

Transducer Parameters Affecting Sonic Cleaning

L. J. Lyons

Removal of Water-Soluble Flux from Assembled Printed Circuit Boards

Jack E. Smallwood

Size Distribution and Identification of Air-Borne Particulates

Fred Allison

ARC Sealing of Borosilicate Glasses

Morris Liebson

Recommended Practices for Safe Handling of Beryllium Oxide Ceramics

Laurence E. Ferreira

Beryllium Oxide Dielectric Heat Sinks for Electronic Devices

P. Hessinger, A. Strott, B. Haura

Sulfamic Acid Cleaning of Electron Tube Parts

Robert W. Etter

A 24-Position Semiautomatic Vacuum Tube Exhaust Machine

L. Quaglia, J. Byrne, G. Reyling

Purification, Distribution, Control, and Monitoring of High-Purity Gases for Electron Device Processing

Mal D. Rogers

Comparison of Standard Leak Rates Measured by Viscous and Molecular Flow Techniques

D. W. Maurer

Gas Composition During Pumping and in Sealed-off Power Tubes

P. F. Váradi, H. A. Langer, M. N. Saltzman

Determination of Trace Amounts of Oxygen in Protective Gaseous Ambients

D. O. Feder, W. H. Craft

Mass Spectrometric Studies of Power Klystron Exhaust Processing

Lowell Noble, Robert K. Waits

Quality Control of Getters

P. Della Porta, E. Airoldi

Residual Gas Content as a Function of Tube Processing

H. B. Frost

Changes in Stability of Germanium Alloy Transistors Through Etching, Washing, and Encapsulation Processing

Arnold J. Borofsky

Effects of Various Cleaning Methods on Electronic Components in the Micromodule

J. L. Vossen

Noise-Tested Cathode Activation

F. Dlouhy, H. J. Schuetze

Appendix: Organization of Committee F-1 on Materials for Electron Tubesand Semiconductor Devices Free

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Details

Developed by Committee: F01

DOI: 10.1520/STP300-EB

ISBN-EB: 978-0-8031-5963-1

ISBN-13: 978-0-8031-6117-7