The Effect of Laser Annealing on Laser Induced Damage Threshold

NC Kerr; DC Emmony

doi:10.1520/STP26484S

SYMPOSIA PAPER Published: 01 January 1990

STP26484S

The Effect of Laser Annealing on Laser Induced Damage Threshold

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A significant enhancement of the single shot Laser Induced Damage Threshold of CaF₂ and fused silica and a moderate enhancement for GaAs and Al has been observed as the result of laser annealing using an excimer laser operating at 248 nm. This phenomenon is primarily attributed to a reduction of the residual surface roughness of the samples.

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Kerr, NC

Emmony, DC

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Details

Developed by Committee: E13

Pages: 164–179

DOI: 10.1520/STP26484S

ISBN-EB: 978-0-8031-5157-4

ISBN-13: 978-0-8031-4478-1

The Effect of Laser Annealing on Laser Induced Damage Threshold

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