Particulate Control in VLSI Gases

JM Davidson; TP Ruane

doi:10.1520/STP25782S

SYMPOSIA PAPER Published: 01 January 1987

STP25782S

Particulate Control in VLSI Gases

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Semiconductor device miniaturization has required continually decreasing levels of particulate contamination in process gases. This paper briefly reviews existing technologies for analyzing and for minimizing particles in VLSI gas streams. Recent advances and research topics in both areas are also addressed. Examples from laboratory and field evaluations of VLSI and non-VLSI systems are discussed.

Author Information

Davidson, JM

Ruane, TP

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Details

Developed by Committee: F01

Pages: 436–450

DOI: 10.1520/STP25782S

ISBN-EB: 978-0-8031-5021-8

ISBN-13: 978-0-8031-0459-4

Particulate Control in VLSI Gases

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