Free Carrier Absorption and Interstitial Oxygen Measurements

WK Gladden; A Baghdadi

doi:10.1520/STP25775S

SYMPOSIA PAPER Published: 01 January 1987

STP25775S

Free Carrier Absorption and Interstitial Oxygen Measurements

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The infrared (IR) absorption of n- and p-type silicon samples was measured over the concentration range ∼10¹⁵ to 6×10¹⁷ atoms/-cm⁻³. The free carrier absorption exhibited a power-law dependence on wavenumber. The data were fit to a logarithmic function with this dependence, and these results were applied to the determination of the baseline from which to compute the corrected net IR absorption at 1107 cm⁻¹ due to interstitial oxygen. Application of this correction for the free carrier absorption results in an improvement of 3% to 30% in the accuracy of the oxygen content determination at dopant concentrations above 10¹⁶ atoms/cm³.

Author Information

Gladden, WK

Baghdadi, A

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Details

Developed by Committee: F01

Pages: 353–364

DOI: 10.1520/STP25775S

ISBN-EB: 978-0-8031-5021-8

ISBN-13: 978-0-8031-0459-4

Free Carrier Absorption and Interstitial Oxygen Measurements

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