The Physical Basis for Quantitative Surface Analysis by Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy

CJ Powell

doi:10.1520/STP25597S

SYMPOSIA PAPER Published: 01 January 1978

STP25597S

The Physical Basis for Quantitative Surface Analysis by Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy

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A review is given of the physical basis for quantitative surface analysis by Auger electron spectroscopy (AES) and by X-ray photoelectron spectroscopy (XPS) or electron spectroscopy for chemical analysis (ESCA). The principal topics discussed are: the feasibility of surface analysis, approaches to surface analysis, description of models and data for surface analysis by AES and XPS, analytical methods, intensity measurements, practical considerations, applications, and reference materials.

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Powell, CJ

U.S. Department of Commerce, National Bureau of Standards, Washington, D.C.

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Details

Developed by Committee: E42

Pages: 5–30

DOI: 10.1520/STP25597S

ISBN-EB: 978-0-8031-4715-7

ISBN-13: 978-0-8031-0543-0

The Physical Basis for Quantitative Surface Analysis by Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy

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