Comparative Study of Reactively Evaporated vs. Ion-Plated TiO Thin Films

KH Guenther; B Loo; HK Pulker; A Saxer; SC Seitel

doi:10.1520/STP24433S

SYMPOSIA PAPER Published: 01 January 1988

STP24433S

Comparative Study of Reactively Evaporated vs. Ion-Plated TiO Thin Films

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Single-layer thin films of TiO₂ deposited on glass substrates by means of standard reactive evaporation (from a boat) and by means of the novel deposition technique of ion-plating were characterized with a transmission electron microscope, a Raman microprobe, a thermal deflection spectrometer, and a Talystep stylus-type surface profiling instrument. With each deposition technique, single-layer coatings of different thicknesses were produced, from one QWOT up to 12 QWOT @ 633 nm). The thickness dependence of microstructure, surface roughness, and absorption for the two groups of coatings will be presented, together with laser damage threshold measurements at 532 nm.

Author Information

Guenther, KH

Loo, B

Pulker, HK

Saxer, A

Seitel, SC

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Developed by Committee: F01

Pages: 278–278

DOI: 10.1520/STP24433S

ISBN-EB: 978-0-8031-5033-1

ISBN-13: 978-0-8031-4481-1

Comparative Study of Reactively Evaporated vs. Ion-Plated TiO Thin Films

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