A Chemical Precursor to Optical Damage? Studies by Laser Ionization Mass Spectrometry

NS Nogar; RC Estler

doi:10.1520/STP24422S

SYMPOSIA PAPER Published: 01 January 1988

STP24422S

A Chemical Precursor to Optical Damage? Studies by Laser Ionization Mass Spectrometry

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Mass spectrometry has been used in conjunction with Nomarski microscopy to characterize the initiation of optical damage in selected commercial optics. For a sample with a Al₂O₃/SiO₂ multilayer coating (351 nm) on a Si substrate, our results suggest layer by layer removal of the coating material with low-fluence irradiation at 1.06 μ. Inaddition, carbon impurities were observed in the low-damage threshold sample. For the Sc₂O₃/SiO₂ multilayer coated (351 nm) 7940 substrates, transient iron signals were observed at each increasing fluence level, with concomitant appearance of small circular (10μ) pits in the surface. These pits were also associated with macroscopic damage features due to threshold testing.

Author Information

Nogar, NS

Estler, RC

Fort Lewis College, Durango, Colorado

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Developed by Committee: F01

Pages: 187–195

DOI: 10.1520/STP24422S

ISBN-EB: 978-0-8031-5033-1

ISBN-13: 978-0-8031-4481-1

A Chemical Precursor to Optical Damage? Studies by Laser Ionization Mass Spectrometry

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