Highly Damage-Resistant Reflectors for 248 nm Formed by Fluorides Multilayers

T Izawa; N Yamamura; R Uchimura; I Hashimoto; T Yakuoh; Y Owadano; Y Matsumoto; M Yano

doi:10.1520/STP23641S

SYMPOSIA PAPER Published: 01 January 1991

STP23641S

Highly Damage-Resistant Reflectors for 248 nm Formed by Fluorides Multilayers

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We investigated the laser damage thresholds and optical performances of fluorides multilayered reflectors, consisting of middle index fluoride and Na₃AlF₆ for high power KrF laser applications. It was found the damage thresholds of those reflectors are significantly improved by laser annealing. Those reflectors with annealing resisted against the fluence of 18 – 27 J/cm² (This fluence varies on combinations of various fluorides) for 248 nm, 15 nsec, 10 Hz pulses.

Author Information

Izawa, T

Yamamura, N

Uchimura, R

Hashimoto, I

Yakuoh, T

Owadano, Y

Matsumoto, Y

Yano, M

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Developed by Committee: F01

Pages: 339–344

DOI: 10.1520/STP23641S

ISBN-EB: 978-0-8031-5179-6

ISBN-13: 978-0-8194-0532-6

Highly Damage-Resistant Reflectors for 248 nm Formed by Fluorides Multilayers

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