Photoacoustic Characterization of Surface Absorption

DW Reicher; SR Wilson; CF Kranenberg; JR McNeil; SRJ Brueck; MYA Raja

doi:10.1520/STP23618S

SYMPOSIA PAPER Published: 01 January 1991

STP23618S

Photoacoustic Characterization of Surface Absorption

Source

Photoacoustic spectrososcopy is used to characterize the surface absorption of polished fused silica substrates and thin films deposited on fused silica substrates. The extreme sensitivity of this technique allows measurement of surface absorptions of a few tenths of a part per million. Characterization of samples with surfaces finished using a variety of methods is reported.

Author Information

Reicher, DW

Wilson, SR

Kranenberg, CF

Raja, MYA

University of North Carolina at Charlotte, Charlotte, N. C.

McNeil, JR

Brueck, SRJ

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Details

Developed by Committee: F01

Pages: 106–112

DOI: 10.1520/STP23618S

ISBN-EB: 978-0-8031-5179-6

ISBN-13: 978-0-8194-0532-6

Photoacoustic Characterization of Surface Absorption

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