Ultraviolet Thin Film Coating Characterization

AF Stewar; DJ Gallant

doi:10.1520/STP23128S

SYMPOSIA PAPER Published: 01 January 1986

STP23128S

Ultraviolet Thin Film Coating Characterization

Source

Multilayer dielectric high reflectance coatings designed for 351nm were fabricated using ion beam sputtering and electron beam deposition on super polished silicon substrates. These optics were evaluated in terms of total integrated scatter levels, absorption, reflectance and laser induced damage thresholds. Ion beam sputtering was found to produce optics with the lowest losses while electron beam deposited coatings demonstrated higher laser damage thresholds.

Author Information

Stewar, AF

Gallant, DJ

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Details

Developed by Committee: E13

Pages: 272–284

DOI: 10.1520/STP23128S

ISBN-EB: 978-0-8031-4997-7

ISBN-13: 978-0-8031-0960-5

Ultraviolet Thin Film Coating Characterization

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