High-Precision Damage-Resistant Multiple-Pass Ultraviolet Reflectometer
SourceA multiple-pass cell was reported by John White in 1942 [1]. Since then, it has been adapted for use as a high-precision reflectometer. The multiple-pass reflectometer has been studied and reported by Arnon and Baumeister [2].
Here, a reflectometer which is similar is described. It utilizes a uv laser operating at λ = 351 nm as the source and the White-cell mirrors are high-reflection dielectric coatings designed for that wavelength. Because of the low-loss reflectors used in the cell, a high number of traversals, reflections, can be achieved; R ≥ 239. The use of dielectric mirrors also improves the damage resistance of the apparatus which is important when a uv laser beam is used.
The results of reflectance measurements performed on several ultraviolet high reflectors are also reported. These include conventional dielectric coatings as well as a hybrid coating consisting of Al2O3, HfO2, and SiO2 layers.