1064 nm and 350 nm Laser Damage Thresholds of High Index Oxide Films Deposited from Organic Solutions and Sols

I Thomas; J Wilder; R Gonzales; D George

doi:10.1520/STP18576S

SYMPOSIA PAPER Published: 01 January 1988

STP18576S

1064 nm and 350 nm Laser Damage Thresholds of High Index Oxide Films Deposited from Organic Solutions and Sols

Source

High index optical coatings of the oxides TiO₂, Ta₂O₅, ZrO₂ and HfO₂ have been prepared from solutions of metal organic precursors and from colloidal oxide suspensions. Room temperature processing gives porous coatings of comparatively low refractive index (1.8-1.9). Heat treatments can, in some cases, increase the index. Laser damage threshold levels at 1064 nm with a single 1 ns pulse are in the range 6–10 J/cm², which is comparable with coatings of the same materials produced by electron beam evaporation. Lower figures are obtained at 350 nm with a 25 ns pulse under multishot (25 Hz) conditions.

Author Information

Thomas, I

Wilder, J

Gonzales, R

George, D

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Details

Developed by Committee: F01

Pages: 361–364

DOI: 10.1520/STP18576S

ISBN-EB: 978-0-8031-5032-4

ISBN-13: 978-0-8031-4477-4

1064 nm and 350 nm Laser Damage Thresholds of High Index Oxide Films Deposited from Organic Solutions and Sols

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