Journal
Published Online: 01 November 2006
Volume 3, Issue 10
New Approaches in Investigation of Removal Mechanisms during Copper Chemical-Mechanical Polishing
CODEN: JAIOAD
Abstract
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Author Information
Kulkarni, M
Texas A & M University, TX
Greisen, D
Texas A & M University, TX
Ng, D
Texas A & M University, TX
Liang, H
Texas A & M University, TX
Pages: 7
Price: $25.00
Reprints and Permissions
Details
Stock #: JAI100287
ISSN: 1546-962X
DOI: 10.1520/JAI100287