Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications F1709-97 ASTM|F1709-97|en-US Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications Standard F1709 Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications> new BOS Vol. 10.04 Committee F01

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Scope

1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.

1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.

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Details

Book of Standards Volume: 10.04

Developed by Subcommittee: F01.17

Pages: 3

DOI: 10.1520/F1709-97

ICS Code: 31.120

Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

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