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Last Updated: Jul 06, 2011
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ASTM F1513-99(2003)
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications
F1513-99R03
ASTM|F1513-99R03|en-US
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications
Standard
F1513 Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications>
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BOS Vol. 10.04 Committee F01
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Abstract
This specification sets purity grade levels, physical attributes, analytical methods, and packaging of three grades of pure unalloyed aluminum source materials for electronic thin film applications such as evaporation sources and sputtering targets. The impurity levels should be analyzed using the proposed method and should be within the specified range for each grade.
Scope
1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The material is used as-supplied in some cases (for example, as e-beam evaporation sources). In other instances it may be remelted, alloyed, cast and processed by the purchaser to make finished products (for example, sputtering targets).
1.2 This specification sets purity grade levels, physical attributes, analytical methods, and packaging.
1.3 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.