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Last Updated: Aug 16, 2017
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ASTM E1127-03
Standard Guide for Depth Profiling in Auger Electron Spectroscopy
Standard Guide for Depth Profiling in Auger Electron Spectroscopy
E1127-03
ASTM|E1127-03|en-US
Standard Guide for Depth Profiling in Auger Electron Spectroscopy
Standard
E1127 Standard Guide for Depth Profiling in Auger Electron Spectroscopy>
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BOS Vol. 03.06 Committee E42
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Significance and Use
Auger electron spectroscopy yields information concerning the chemical and physical state of a solid surface in the near surface region. Nondestructive depth profiling is limited to this near surface region. Techniques for measuring the crater depths and film thicknesses are given in (35).
Ion sputtering is primarily used for depths of less than the order of 1 μm.
Angle lapping or mechanical cratering is primarily used for depths greater than the order of 1 μm.
The choice of depth profiling methods for investigating an interface depends on surface roughness, interface roughness, and film thickness (1).3
Scope
1.1 This guide covers procedures used for depth profiling in Auger electron spectroscopy.
1.2 Guidelines are given for depth profiling by the following:
| Section | |
| Ion Sputtering | 6 |
| Angle Lapping and Cross-Sectioning | 7 |
| Mechanical Cratering | 8 |
| Nondestructive Depth Profiling | 9 |
1.3 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.